摘要
Abstract Since the invention of the transistor in 1947, semiconductors have seen phenomenal development in accordance with Moore’s Law G. E. Moore, Electronics 38 , 19, (1965), which is based on Dennard’s theory R. H. Dennard, et al. IEEE J. Solid-State Circuits , 9 , 256 (1974) on scaling. More than 30 years have passed since the advent of CMP M. Kashiwagi, CMP Science , 26 , (1977), the “most amazing technology that has contributed most to Moore’s law” according to Dr. Moore. Beginning with the CMP life cycle, this paper looks back on the history of CMP development, recognizes the current situation, and overlooks the future of polishing, cleaning, and monitoring. The paper also introduces the evolution of CMP, a revolutionary technology that emerged in the 1980s, together with some trivia from that period, and further introduces some episodes that are already or will be handed down as legends. In preparation for the paradigm revolution of semiconductors that is expected to occur in 2030, CMP software, as well as hardware, needs to advance more dramatically than before.