The Materials Challenge in Diffraction-Unlimited Direct-Laser-Writing Optical Lithography

Advanced MaterialsVolume 22, Issue 32 p. 3578-3582 Communication The Materials Challenge in Diffraction-Unlimited Direct-Laser-Writing Optical Lithography Joachim Fischer, Corresponding Author Joachim Fischer [email protected] Institut für Angewandte Physik and DFG-Center for Functional, Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe (Germany)Institut für Angewandte Physik and DFG-Center for Functional, Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe (Germany).Search for more papers by this authorGeorg von Freymann, Georg von Freymann Institut für Angewandte Physik and DFG-Center for Functional, Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe (Germany) Institut für Nanotechnologie, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, D-76344 Eggenstein-Leopoldshafen (Germany)Search for more papers by this authorMartin Wegener, Martin Wegener Institut für Angewandte Physik and DFG-Center for Functional, Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe (Germany) Institut für Nanotechnologie, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, D-76344 Eggenstein-Leopoldshafen (Germany)Search for more papers by this author Joachim Fischer, Corresponding Author Joachim Fischer [email protected] Institut für Angewandte Physik and DFG-Center for Functional, Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe (Germany)Institut für Angewandte Physik and DFG-Center for Functional, Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe (Germany).Search for more papers by this authorGeorg von Freymann, Georg von Freymann Institut für Angewandte Physik and DFG-Center for Functional, Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe (Germany) Institut für Nanotechnologie, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, D-76344 Eggenstein-Leopoldshafen (Germany)Search for more papers by this authorMartin Wegener, Martin Wegener Institut für Angewandte Physik and DFG-Center for Functional, Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe (Germany) Institut für Nanotechnologie, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, D-76344 Eggenstein-Leopoldshafen (Germany)Search for more papers by this author First published: 30 June 2010 https://doi.org/10.1002/adma.201000892Citations: 203Read the full textAboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Graphical Abstract Using a novel photoresist (composed of pentaerythritol triacrylate and isopropyl thioxanthone) that favors stimulated emission depletion by a π-π* transition and using a two-color two-photon excitation scheme, 65-nm wide lines are achieved. This value is limited by parasitic two-photon absorption of the continuous-wave depletion beam. It is estimated that, without this process, line widths of 30 nm are in reach. References 1 S. W. Hell, J. Wichmann, Opt. Lett. 1994, 19, 780. 2 T. A. Klar, S. Jakobs, M. Dyba, A. Egner, S. W. Hell, Proc. Natl. Acad. Sci. 2000, 97, 8206. 3 S. W. Hell, Phys. Lett. A 2004, 326, 140. 4 S. W. Hell, Nat. Methods 2009, 6, 24. 5 K. I. Willig, S. O. Rizzoli, V. Westphal, R. Jahn, S. W. Hell, Nature 2006, 440, 935. 6 S. W. Hell, R. Schmidt, A. Egner, Nat. Photon. 2009, 3, 381. 7 E. Rittweger, K. Y. Han, S. E. Irvine, C. Eggeling, S. W. Hell, Nat. Photon. 2009, 3, 144. 8 S. Kawata, H.-B. Sun, T. Tanaka, K. 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Express 2004, 12, 3605. 20 A. S. van de Nes, L. Billy, S. F. Pereira, J. J. M. Braat, Opt. Express 2004, 12, 1281. Citing Literature Volume22, Issue32August 24, 2010Pages 3578-3582 ReferencesRelatedInformation