聚酰亚胺
石墨
材料科学
石墨烯
热导率
复合材料
微电子
导电体
Kapton
图层(电子)
纳米技术
作者
Shuaizhen Li,Zhibo Zheng,Siwei Liu,Zhenguo Chi,Xudong Chen,Yi Zhang,Jiarui Xu
标识
DOI:10.1016/j.cej.2021.132530
摘要
High-efficiency heat-dissipation materials are in urgent need in microelectronics industry in 5G era. However, large-scale, low-cost, and high-efficiency preparation technologies still have great challenges. Here, ultrahigh thermal and electric conductive graphite films prepared by graphite-phase carbon nitride (g-C3N4) catalyzed graphitization of polyimide film (PI) were reported for the first time. The graphite film obtained from 0.25 wt% g-C3N4 catalyzed polyimide graphitization (G0.25) has homogeneous and perfect graphene structure and state-of-the-art properties. The d-spacing of the graphite layers is about 0.335 nm, which is similar to the ideal layer thickness of graphene (0.334 nm). The thermal conductivity is 1781 W·m−1·K−1 and the conductivity is 1.63 × 106 S·m−1, which is 1.49 and 2.18 times of graphite film from pure PI film, 1.94 and 2.34 times of graphite film from commercialized Kapton film (I-film), respectively. The thermal conductivity of G0.25 film is 4.52 times of Cu and 7.46 times of Al. More importantly, the addition of g-C3N4 can reduce the graphitization temperature from 2800 to 2500 ℃, which can reduce the energy consumption by 20.5% in the whole polyimide graphitization process. The developed preparation technology has important guiding significance and very attractive industrial application value for the preparation of large-scale, low cost and high-quality heat dissipation materials.
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