石墨烯
分子动力学
异质结
声子
材料科学
空位缺陷
化学物理
联轴节(管道)
原子间势
热导率
纳米技术
光电子学
凝聚态物理
计算化学
化学
物理
复合材料
作者
Dong Shi-lin,Bowen Yang,Qian Xin,Xin Lan,Xinyu Wang,Gongming Xin
摘要
Graphene/β-Ga2O3 heterojunctions are widely used in high-power and high-frequency devices, for which thermal management is vital to the device operation and life. Here we apply molecular dynamics simulation to calculate the interfacial thermal resistance (ITR) between graphene and β-Ga2O3. Based on the rigid ion model, a self-consistent interatomic potential with a set of parameters that can well reproduce the basic physical properties of crystal β-Ga2O3 is fitted. Using this potential, the effects of model size, interface type, temperature, vacancy defects and graphene hydrogenation on the ITR of graphene/β-Ga2O3 heterojunctions are evaluated. The results show that there is no obvious dependence of ITR on the size of graphene and β-Ga2O3. It is reported that the ITR values of the (100), (010) and (001) interfaces are 7.28 ± 0.35 × 10-8 K m2 W-1, 6.69 ± 0.44 × 10-8 K m2 W-1 and 5.22 ± 0.35 × 10-8 K m2 W-1 at 300 K, respectively. Both temperature increase and vacancy defect increase can prompt the energy propagation across graphene/β-Ga2O3 interfaces due to the enhancement of phonon coupling. In addition, graphene hydrogenation provides new channels for in-plane and out-of-plane phonon coupling, and thus reduces the ITR between graphene and β-Ga2O3. This study provides basic strategies for the thermal design and management of graphene/β-Ga2O3 based photoelectric devices.
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