材料科学
光电子学
阈值电压
量子点
场效应晶体管
晶体管
跨导
二极管
十八烷基三氯氢硅
电压
纳米技术
二硫化钼
电气工程
硅
工程类
冶金
作者
Jeongkyun Roh,Jae Hyeon Ryu,Geun Woo Baek,Heeyoung Jung,Seung Gi Seo,Kunsik An,Byeong Guk Jeong,Doh C. Lee,Byung Hee Hong,Wan Ki Bae,Jong‐Ho Lee,Changhee Lee,Sung Hun Jin
出处
期刊:Small
[Wiley]
日期:2019-01-13
卷期号:15 (7)
被引量:18
标识
DOI:10.1002/smll.201803852
摘要
Abstract In recent past, for next‐generation device opportunities such as sub‐10 nm channel field‐effect transistors (FETs), tunneling FETs, and high‐end display backplanes, tremendous research on multilayered molybdenum disulfide (MoS 2 ) among transition metal dichalcogenides has been actively performed. However, nonavailability on a matured threshold voltage control scheme, like a substitutional doping in Si technology, has been plagued for the prosperity of 2D materials in electronics. Herein, an adjustment scheme for threshold voltage of MoS 2 FETs by using self‐assembled monolayer treatment via octadecyltrichlorosilane is proposed and demonstrated to show MoS 2 FETs in an enhancement mode with preservation of electrical parameters such as field‐effect mobility, subthreshold swing, and current on–off ratio. Furthermore, the mechanisms for threshold voltage adjustment are systematically studied by using atomic force microscopy, Raman, temperature‐dependent electrical characterization, etc. For validation of effects of threshold voltage engineering on MoS 2 FETs, full swing inverters, comprising enhancement mode drivers and depletion mode loads are perfectly demonstrated with a maximum gain of 18.2 and a noise margin of ≈45% of 1/2 V DD . More impressively, quantum dot light‐emitting diodes, driven by enhancement mode MoS 2 FETs, stably demonstrate 120 cd m −2 at the gate‐to‐source voltage of 5 V, exhibiting promising opportunities for future display application.
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