A programmable UVLED array with a collimated optics as transform lens as light field adjustable source

To achieve the smallest line width of IC requires the spherical and coma aberration free lithography optics. Once the aberration of lens is formed, it is hard to amend the mask to original requirement, unless the light pattern figure is adjustable. A programmable UVLED array with a collimated lens as Fourier transfer lens forms an adjustable pattern as the intensity profile to amend the aberration of mask to form aberration free mask intensity pattern into wafer. A 25 X 25 UVLED array with collimated lens is applied to correct the aberration contained mask, is to form a corrected pattern under the requirement for reducing aberration mask to form a smallest line width.