光电探测器
光电子学
材料科学
暗电流
量子效率
红外线的
短波
石墨烯
光学
纳米技术
物理
辐射传输
作者
Kuen‐Wei Tsai,Min‐Hsien Chen,Gajendra Suthar,Yu‐Tang Hsiao,Lin‐Chieh Cheng,Chuang‐Yi Liao,Fang‐Chung Chen,Chih‐Wei Chu,Yi‐Ming Chang
标识
DOI:10.1002/adom.202302435
摘要
Abstract The significance of shortwave infrared (SWIR) photodetectors spans across various applications. Nevertheless, the limited spectral response of silicon‐based photodetectors and the high cost associated with materials like germanium (Ge) have impeded the widespread adoption of SWIR sensors, particularly in the realm of consumer electronics. This study explores the transformative impact of incorporating a cross‐linkable naphthalenediimide (c‐NDI) as both an electron transporting layer and a hole blocking layer in organic photodetectors (OPDs). The introduction of c‐NDI as an interlayer leads to substantial enhancements in SWIR OPD performance, particularly in terms of reducing dark current and augmenting external quantum efficiency. These improvements are most notable in ultra‐narrow bandgap SWIR systems, where c‐NDI demonstrates superior hole‐blocking capabilities. Besides, OPDs with c‐NDI interlayers also exhibit exceptional stability over time when compared to OPDs based on zinc oxide interlayer, underscoring c‐NDI‘s versatility as an interlayer. Most importantly, when compared to a commercially available Ge photodetector, c‐NDI‐based OPD demonstrates competitive detectivity, achieving 2.67 × 10 11 Jones at a wavelength of 1300 nm. This performance even surpasses that of the Ge photodetector, highlighting the substantial potential of OPDs for SWIR imaging applications.
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