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Resonant transition metal Ti or Ta doping in high mobility transparent conducting CdO: The effects of doping concentration

材料科学 兴奋剂 过渡金属 光电子学 凝聚态物理 纳米技术 生物化学 化学 物理 催化作用
作者
Chao Ping Liu,Shan Wu,Yang Zhang,Shen Jie Zha,Gui Shan Liu,Xiong Jing Chen,Bei Deng,Chun Yuen Ho,K. M. Yu
出处
期刊:Physical Review Materials [American Physical Society]
卷期号:8 (4) 被引量:2
标识
DOI:10.1103/physrevmaterials.8.044603
摘要

Recent studies have shown that transparent conducting oxides (TCOs) such as $\mathrm{I}{\mathrm{n}}_{2}{\mathrm{O}}_{3}$ or $\mathrm{Sn}{\mathrm{O}}_{2}$ exhibited enhanced mobility through resonant transition metal (TM) doping. However, our previous investigations of CdO, another TCO, doped with TM elements with partially filled 3d- or $4d$ shells, such as Sc, Ti, V, Mo, and W, could exhibit high electron concentration $N$ but experienced a notable reduction in electron mobility \ensuremath{\mu} when the TM concentration ${x}_{\mathrm{TM}}$ exceeded $\ensuremath{\sim}4%$. Here, we conducted computational and experimental analyses to explore the electronic structure and optoelectronic properties of CdO doped with two distinct representative TM dopants, Ti and Ta, featuring partially filled 3d- and $5d$ shells, respectively, with varying ${x}_{\mathrm{TM}}$. Density-functional theory calculations unveiled that the localized $d$-donor states of TM interact with the extended CdO conduction-band states, resulting in a lower occupied ${E}^{\ensuremath{-}}$ subband and an upper unoccupied ${E}^{+}$ subband, consistent with predictions from the band anticrossing model. The reduced \ensuremath{\mu} in the TM-doped CdO with relatively high ${x}_{\mathrm{TM}}$ can thus be attributed to both the relatively small dispersion of this ${E}^{\ensuremath{-}}$ conduction band and increased defect scattering. This is also supported by the increased electron effective mass ${m}^{*}$ and reduced mean scattering time \ensuremath{\tau} derived from spectroscopic ellipsometry analysis using the Drude model. Furthermore, the decrease in $N$ with high ${x}_{\mathrm{TM}}$ might be due to compensation by oxygen interstitials ${\mathrm{O}}_{i}$ acceptors, enhanced electron correlation effect, and/or TM aggregation. Moreover, we find that CdO:TM films with ${x}_{\mathrm{TM}}>\ensuremath{\sim}2%$ demonstrated enhanced environmental stability in ambient air (with $\ensuremath{\sim}45%$ relative humidity), possibly attributed to a lower concentration of ${V}_{\mathrm{O}}\ensuremath{-}\mathrm{related}$ defects. Comparatively, Ta doping in CdO yielded electrical properties superior than Ti, owing to the relatively weaker electron correlation in Ta $5d$ orbitals. These findings offer valuable insights into TM doping of CdO and other TCOs.
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