计算机科学
集合(抽象数据类型)
并行计算
计算科学
程序设计语言
作者
Ziyang Yu,Guojin Chen,Yuzhe Ma,Bei Yu
标识
DOI:10.23919/date51398.2021.9474212
摘要
As the feature size of advanced integrated circuits keeps shrinking, resolution enhancement technique (RET) is utilized to improve the printability in the lithography process. Optical proximity correction (OPC) is one of the most widely used RETs aiming at compensating the mask to generate a more precise wafer image. In this paper, we put forward a level-set based OPC with high mask optimization quality and fast convergence. In order to suppress the disturbance of the condition fluctuation in lithography process, we propose a new process window-aware cost function. Then, a novel momentum-based evolution technique is adopted, which demonstrates substantial improvement. Moreover, graphics processing unit (GPU) is leveraged for accelerating the proposed algorithm. Experimental results on ICCAD 2013 benchmarks show that our algorithm outperforms all previous OPC algorithms in terms of both solution quality and runtime overhead.
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