材料科学
横截面
凝聚态物理
失真(音乐)
带隙
硅
电子能带结构
能量(信号处理)
剪切(地质)
类型(生物学)
晶体硅
物理
复合材料
光电子学
量子力学
工程类
CMOS芯片
放大器
生态学
生物
结构工程
作者
Koichi Nakamura,Yoshitada Isono,Toshiyuki Toriyama,Susumu Sugiyama
标识
DOI:10.1103/physrevb.80.045205
摘要
We have simulated the piezoresistivity in $n$-type single-crystal bulk silicon based on the first-principles electronic band structure of model structures. Our simple procedure to calculate the piezoresistance coefficients is valid qualitatively and quantitatively for carrier electron transport in the multivalley conduction-band structure of $n$-type bulk silicon; the primitive longitudinal and transverse piezoresistance coefficients originate from the energy gap between the valleys, whereas the shear piezoresistance coefficient ${\ensuremath{\pi}}_{44}$ arises from a distortion of the band energy surface in the valleys and can be presented clearly as a negative constant. The distinction between the origins of longitudinal, transverse, and shear piezoresistivity can be followed as a dependence on a carrier concentration or temperature.
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