材料科学
化学气相沉积
兴奋剂
分子束外延
沉积(地质)
光电子学
半导体
纳米技术
接受者
物理气相沉积
带隙
激子
宽禁带半导体
薄膜
外延
物理
古生物学
图层(电子)
凝聚态物理
量子力学
沉积物
生物
作者
Ruqi Yang,Fengzhi Wang,Jianguo Lü,Yangdan Lu,Bojing Lu,Siqin Li,Zhizhen Ye
标识
DOI:10.1021/acsaelm.3c00515
摘要
ZnO is a significant semiconductor material with the characteristics of direct band gap, large exciton binding energy, and easy growth of high-quality nanostructures, and it is widely used in various fields. However, obtaining high-quality p-type ZnO has become a significant obstacle to the wide application of ZnO. The research on p-ZnO started several decades ago and is regarded as the research focus. Many researchers have obtained high-quality p-ZnO by chemical vapor deposition (CVD) and physical vapor deposition (PVD). To obtain high-quality p-ZnO, researchers have used some "better" techniques to improve the crystal quality and mobility of p-ZnO, such as molecular beam epitaxy (MBE) and post-treatment. This review provides an overview of some methods for obtaining high-quality p-ZnO, such as increasing the acceptor concentration, shallowing acceptor energy levels, and reducing donor defects. In addition, we also review the applications of p-ZnO in LEDs, UV detectors, thin-film transistors, gas sensing, bionic materials, and other fields.
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