肖特基势垒
半导体
肖特基二极管
光电子学
材料科学
范德瓦尔斯力
金属半导体结
GSM演进的增强数据速率
接口(物质)
半导体器件
费米能级
工程物理
纳米技术
带隙
电场
宽禁带半导体
凝聚态物理
化学
物理
计算机科学
二极管
接触角
电信
图层(电子)
复合材料
有机化学
电子
量子力学
坐滴法
分子
作者
Jianping Meng,Chengkuo Lee,Zhou Li
标识
DOI:10.1016/j.scib.2024.03.003
摘要
The Schottky contact which is a crucial interface between semiconductors and metals is becoming increasingly significant in nano-semiconductor devices. A Schottky barrier, also known as the energy barrier, controls the depletion width and carrier transport across the metal–semiconductor interface. Controlling or adjusting Schottky barrier height (SBH) has always been a vital issue in the successful operation of any semiconductor device. This review provides a comprehensive overview of the static and dynamic adjustment methods of SBH, with a particular focus on the recent advancements in nano-semiconductor devices. These methods encompass the work function of the metals, interface gap states, surface modification, image-lowering effect, external electric field, light illumination, and piezotronic effect. We also discuss strategies to overcome the Fermi-level pinning effect caused by interface gap states, including van der Waals contact and 1D edge metal contact. Finally, this review concludes with future perspectives in this field.
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