材料科学
热传导
钒
极化子
杂质
电阻率和电导率
薄膜
相变
空间电荷
氢
凝聚态物理
分析化学(期刊)
电子
化学
纳米技术
电气工程
复合材料
冶金
工程类
物理
有机化学
量子力学
色谱法
作者
Н. В. Андреева,Pavel Turalchuk,Д. А. Чигирев,I. Vendik,E. A. Ryndin,В. В. Лучинин
标识
DOI:10.1016/j.chaos.2020.110503
摘要
A study of the voltage-controlled phase transition mechanism in vanadium dioxide thin films was performed in the temperature range 65 – 295 K. Temperature-induced variation of I-V characteristics indicates the type of conductivity defined by space-charge limited currents (SCLC). Based on the analysis of the temperature dependence of sample resistivity, it was found that the dominant transport mechanism is a small polaron hopping conduction. The results of modeling together with obtained experimental data justify the influence of the parameters of trap distribution, associated with oxygen vacancies and hydrogen impurities, on the mechanism of the instability development in vanadium dioxide thin films. At relatively low trap density, the phase transition is more likely initiated electronically. At temperatures below 100 K an appearance of switching with memory is observed. An increase in the trap concentration provokes the prevalence of thermal process in the phase transition triggering.
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