氢
掺杂剂
硫族元素
基面
金属
化学物理
价电子
兴奋剂
过渡金属
Atom(片上系统)
氢原子
价(化学)
电催化剂
原子物理学
化学
材料科学
物理化学
结晶学
催化作用
电子
物理
有机化学
嵌入式系统
计算机科学
电化学
量子力学
电极
烷基
生物化学
光电子学
作者
Mingjie Liu,Mark S. Hybertsen,Qin Wu
标识
DOI:10.1002/anie.202003091
摘要
Abstract Weak binding of hydrogen atoms to the 2H‐MoS 2 basal plane renders MoS 2 inert as an electrocatalyst for the hydrogen evolution reaction. Transition‐metal doping can activate neighboring sulfur atoms in the MoS 2 basal plane to bind hydrogen more strongly. Our theoretical studies show strong variation in the degree of activation by dopants across the 3d transition‐metal series. To understand the trends in activation, we propose a model based on the electronic promotion energy required to partially open the full valence shell of a local S atom and therefore enable it to bond with a H atom. In general, the promotion is achieved through an electron transfer from the S to neighboring metal‐atom sites. Furthermore, we demonstrate a specific, electronic‐structure‐based descriptor for the hydrogen‐binding strength: Δ dp , the local interband energy separation between the lowest empty d‐states on the dopant metal atoms and occupied p‐states on S. This model can be used to provide guidelines for chalcogen activation in future catalyst design based on doped transition‐metal dichalcogenides.
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