煅烧
硫脲
光催化
反应速率常数
镍
化学
Atom(片上系统)
无机化学
硫黄
降级(电信)
核化学
催化作用
材料科学
动力学
有机化学
嵌入式系统
物理
电信
量子力学
计算机科学
作者
Jixiang Xu,Yanfang Chen,Meng Chen,Jing Wang,Lei Wang
标识
DOI:10.1016/j.cej.2022.136208
摘要
Herein, a single-atom Ni/S co-doped g-C3N4 (Ni/S-CN-N) was prepared via thermal polymerization of urea/thiourea complexes of Ni followed by secondary calcination with NH4Cl. The photocatalytic activity of this material was evaluated by degradation of tetracycline (TC) and reduction of CO2. X-ray absorption fine structure measurements and theoretical calculations indicate that single-atom sites of Ni are anchored on g-C3N4 (CN) through Ni-O/N bonds and that they act as active centers to accumulate electrons. NH4Cl-assisted calcination effectively increased the specific surface area of the material. The apparent rate constant for TC degradation over optimized Ni/S-CN-N is 0.031 min−1, 6.0 times higher than pristine CN. Moreover, the Ni/S-CN-N exhibits a high CO2 reduction rate with H2O. The CO and CH4 yields were 58.6 and 18.9 μmol g−1, respectively within 5 h, higher than that of pristine CN (CO: 7.9 μmol g−1, CH4: 0 μmol g−1). This work provides a facile in situ growth strategy to construct CN modified with single-atom metal sites for photocatalytic applications.
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