响应度
光电探测器
材料科学
紫外线
非阻塞I/O
窄带
光电子学
原子层沉积
纳米线
图层(电子)
光学
纳米技术
化学
物理
生物化学
催化作用
作者
Zhao Chen,Borui Li,Xiaoming Mo,Songzhan Li,Jian Wen,Hongwei Lei,Ziqiang Zhu,Guang Yang,Pengbin Gui,Fang Yao,Guojia Fang
摘要
All inorganic, self-powered, narrowband, and rapid response p-NiO/n-ZnO nanowire (NW) ultraviolet (UV) photodetectors were fabricated and investigated with Al2O3 as an interface modification layer. Al2O3 films grown by atomic layer deposition can greatly suppress the surface defects on ZnO NWs and improve the p-NiO/n-ZnO NW interface. The photo-response of the photodetector in the 430–500 nm wavelength range was greatly inhibited and the full-width at half-maximum of the response spectrum was less than 30 nm. A large responsivity of 1.4 mA/W was achieved under a 380 nm UV irradiation (0.36 mW/cm2) at zero bias and the response time of the device was less than 0.04 s. Such a simple interface modification method might promote the developing of ZnO NW based narrowband photodetectors.
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