排水诱导屏障降低
材料科学
信道长度调制
光电子学
速度饱和
短通道效应
阈值电压
MOSFET
晶体管
栅氧化层
泄漏(经济)
电气工程
耗尽区
撞击电离
电子迁移率
电压
电离
工程类
半导体
物理
离子
宏观经济学
经济
量子力学
出处
期刊:Nanoscience and Technology
日期:2016-01-01
卷期号:: 73-93
被引量:56
标识
DOI:10.1007/978-81-322-3625-2_5
摘要
Short-channel effects are a series of phenomena that take place when the channel length of the MOSFET becomes approximately equal to the space charge regions of source and drain junctions with the substrate. They lead to a series of issues including polysilicon gate depletion effectPolysilicon gate depletion effect , threshold voltage roll-offThreshold voltage roll-off , drain-induced barrier lowering (DIBL)Drain-induced barrier lowering (DIBL) , velocity saturationVelocity saturation , reverse leakage current rise, mobility reduction, hot carrier effectsHot carrier effects , and similar other annoyances. Mitigation of the problem posed by polysilicon gate depletion effect via restoration of metal gate structure is presented. Threshold voltage reduction makes it difficult to turn the transistor off completely. By DIBL effect, electrostatic coupling between the source and drain makes the gate ineffective. Velocity saturation decreases the current drive. The leakage current increases the power dissipation. Enhanced surface scattering degrades the mobility of charge carriers affecting the output current. Apart from these factors, impact ionization and hot carrier effects seriously impair the MOSFET performance and cause the device to diverge in behavior from long-channel ones. Notable solutions are the gate oxide thickness cutback, use of high-κ dielectrics, strain engineering, etc. Nevertheless, the various effects mentioned severely downgrade the performance of planar CMOS transistors at process nodes <90 nm.
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