倍半硅氧烷
硅醇
材料科学
聚二甲基硅氧烷
聚酰亚胺
聚合物
X射线光电子能谱
化学工程
涂层
图层(电子)
硅
表面粗糙度
高分子化学
复合材料
有机化学
化学
光电子学
催化作用
工程类
作者
Shuwang Duo,Mi Mi Song,Ting Zhi Li,Ying Luo,Mei Shuan Li
出处
期刊:Advanced Materials Research
日期:2011-02-01
卷期号:189-193: 336-339
被引量:2
标识
DOI:10.4028/www.scientific.net/amr.189-193.336
摘要
Hybrid inorganic/organic polymers have been prepared by copolymerizing a silanol terminated polydimethylsiloxane (PDMS) with an Octa(aminophenyl) -silsesquioxane (POSS). The AO resistance of these POSS/PDMS hybrid films was tested in the ground-based AO simulation facility. Exposed and unexposed surfaces have been characterized by X-ray photoelectron spectroscopy. The XPS data indicate that the carbon content of the near-surface region is decreased from 65.3 to 18.9 at% after AO exposure. The oxygen and silicon concentrations in the near-surface region increase after AO exposure. The data reveal the formation of a passive inorganic SiO 2 layer on the POSS/PDMS hybrid films during the AO exposure, which serves as a protective barrier preventing further degradation of the underlying polymer with increased exposure to the AO flux. The erosion yield of the POSS/PDMS (20 wt%) hybrid film was 1.7×10 -26 cm 3 /atom, decreased by two orders of magnitude compared with the value of 3.0×10 -24 cm 3 /atom of the polyimide film.
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