成核
堆积
材料科学
化学物理
表面能
粘附
结晶学
电子结构
接口(物质)
结构稳定性
计算化学
热力学
化学
复合材料
润湿
物理
工程类
结构工程
有机化学
坐滴法
作者
Yanfeng Han,Yongbing Dai,Da Shu,Jun Wang,Baode Sun
摘要
The atomic structure, adhesion, and interfacial energy of Al∕TiB2 interfaces were studied using first-principles calculations. The preferable interfacial atomic structure is that wherein the Al atoms continue the natural stacking sequence of the bulk TiB2. The interface adhesion for Ti-terminated interface is stronger than that for B-terminated interface. The structural stabilities of two interface terminations depend greatly on the Ti interfacial chemical potential. Calculation of the interfacial energies provides theoretical evidence for the hypernucleation and duplex nucleation grain refinement mechanisms.
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