功勋
截止频率
材料科学
光电子学
基质(水族馆)
晶体管
高电子迁移率晶体管
振荡(细胞信号)
太赫兹辐射
击穿电压
电压
电气工程
化学
生物化学
海洋学
工程类
地质学
作者
Kumud Ranjan,S. Arulkumaran,Geok Ing Ng,S. Vicknesh
标识
DOI:10.7567/apex.7.044102
摘要
AlGaN/GaN high-electron-mobility transistors (HEMTs) with a 0.15-µm gate were fabricated on a Si substrate with an 8-nm-thick AlGaN barrier. The device exhibited a unity current gain cutoff frequency fT of 63 GHz and maximum oscillation frequency fmax of 124 GHz. Its three-terminal OFF-state breakdown voltage BVgd is as high as 132 V. The estimated Johnson's figure of merit (=BVgd × fT) is 8.32 × 1012 V/s (8.32 THz·V), which is the highest value ever reported for a conventional SiN-passivated T-gate AlGaN/GaN HEMTs on a Si substrate without an additional field plate or gamma gate.
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