界面热阻
材料科学
热导率
千分尺
闪光灯(摄影)
复合材料
热扩散率
热阻
微电子
热接触电导
薄膜
热的
热导率测量
激光闪光分析
接触电阻
热接触
热发射率
纳米技术
光学
热力学
物理
图层(电子)
作者
Kefeng Xie,Ying Cui,Xiaoning Ren,Yongxuan Chen,Jun Cai,Wenbing Hu
标识
DOI:10.1016/j.tca.2023.179493
摘要
Thermal contact resistance of thin film materials is an important issue in the heat management of highly integrated microelectronic systems. We proposed a strategy of Flash DSC measurement to characterize simultaneously thermal contact resistance and cross-plane thermal conductivity of Nylon 66 thin films with three thicknesses. We obtained the thermal contact resistance 1.317 × 10−5 m2 K/W at the interface between the sensor and the thin films, which showed as high as 30% in the total thermal resistance of 10 μm thickness thin films. The cross-plane thermal conductivity 0.32 W/(m K) becomes slightly larger than our previous result 0.25 W/(m K), owing to the elimination of thermal contact resistance. Our steady-state measurement could be complemental to ASTM 5470 for the measurement of thermal contact resistance and thermal conductivity in the micrometer scale.
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