X射线光电子能谱
椭圆偏振法
辐照
材料科学
表面改性
化学改性
化学工程
薄膜
分析化学(期刊)
化学
纳米技术
高分子化学
有机化学
物理
核物理学
工程类
作者
B. Schnyder,Thomas Lippert,R. Kötz,Alexander Wokaun,Vera-Maria Graubner,Oskar Nuyken
出处
期刊:Surface Science
[Elsevier]
日期:2003-06-01
卷期号:532-535: 1067-1071
被引量:135
标识
DOI:10.1016/s0039-6028(03)00148-1
摘要
UV-irradiation (172 nm) induced changes of PDMS surfaces were investigated with X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry (SE). Both methods indicate the modification of the PDMS to a silica-like surface (SiO2). These conclusions could be drawn from the elemental composition determined by XPS and the binding energy shifts in the XPS spectra of the Si 2p and O 1s levels. Similarly the refractive index n determined with ellipsometry reaches a value close to the one of SiO2. Additionally, ellipsometry allows to monitor the decrease of the original film thickness with increasing UV-irradiation time.
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