Removal of the antibiotic sulfamethoxazole from environmental water by mesoporous silica-magnetic graphene oxide nanocomposite technology: Adsorption characteristics, coadsorption and uptake mechanism

正硅酸乙酯 吸附 石墨烯 纳米复合材料 溴化铵 介孔材料 水溶液 化学 介孔二氧化硅 化学工程 氧化物 无机化学 疏水效应 朗缪尔吸附模型 离子强度 材料科学 肺表面活性物质 有机化学 催化作用 工程类
作者
Nithiwat Ninwiwek,Parnuch Hongsawat,Patiparn Punyapalakul,Panida Prarat
出处
期刊:Colloids and Surfaces A: Physicochemical and Engineering Aspects [Elsevier]
卷期号:580: 123716-123716 被引量:98
标识
DOI:10.1016/j.colsurfa.2019.123716
摘要

In this study, the mesoporous silica-magnetic graphene oxide nanocomposite material (mGO-Si) was prepared. The surfactant cetyltrimethyl ammonium bromide (CTAB) was utilized as the mesoporous template while the tetraethyl orthosilicate (TEOS) was used as the silica source. The synthesized nanocomposite was characterized through different analyses, namely XRD, XPS, TEM, FT-IR, VSM, BET, and acid-base titration. Various factors like the effects of the initial concentration, contact time, influence of the pH and the coexistence of other antibiotics on the sulfamethoxazole (SMX) uptake, were investigated. Adsorption results exhibited that the mGO-Si adsorbed the SMX molecules more effectively than the pristine magnetic graphene oxide (mGO). Kinetic data showed good correlation on the basis of the pseudo-second-order model. The equilibrium adsorption data fitted well to the Langmuir model, and a maximum SMX adsorption capacity of 15.46 mg/g was obtained. At high pH, the solution had significantly impaired then declined capacity of SMX adsorption. Electrostatic repulsion occurred between the dissociated SMX and the more negatively charged mGO-Si at basic pH. Adsorption mechanisms between SMX and mGO-Si were plausibly activated by hydrogen bonding, π–π EDA interactions, and solution pH-based electrostatic interactions dependent upon the status of SMX and the pH ,PZC of mGO-Si. Moreover, the CIP and OTC competitors in the mixed solute system managed to improve the SMX adsorption by acting as a bridge to form CIP−SMX−mGO-Si/ OTC−SMX−mGO-Si surface complex. At low aqueous phase concentration of SMX, CIP was likely to form a stronger electrostatic interaction system with the adsorbent, thereby resulting in an adsorption level which was more competitive in the process opposing CIP to SMX than in that opposing OTC to SMX.
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