作者
José Silva,Ruben Alcala,Uygar E. Avci,Nick Barrett,Laura Bégon-Lours,Bertil Borg,Seungyong Byun,Sou-Chi Chang,Sang-Wook Cheong,Duk-Hyun Choe,J. Coignus,V. Deshpande,A. Dimoulas,C. Dubourdieu,Ignasi Fina,Hiroshi Funakubo,L. Grenouillet,Alexei Gruverman,Jinseong Heo,Michael Hoffmann,H. Alex Hsain,Fei-Ting Huang,Cheol Seong Hwang,Jorge Íñiguez,Jacob L. Jones,I. V. Karpov,Alfred Kersch,Taegyu Kwon,Suzanne Lancaster,Maximilian Lederer,Younghwan Lee,Patrick D. Lomenzo,Lane W. Martin,Simon J. Martin,Shinji Migita,Thomas Mikolajick,Beatriz Noheda,Min Hyuk Park,Karin M. Rabe,Sayeef Salahuddin,F. Sánchez,Konrad Seidel,Takashi Shiraishi,Takahisa Shiraishi,Stefan Slesazeck,Akira Toriumi,Hiroshi Uchida,Bertrand Vilquin,Xianghan Xu,Kun Hee Ye,Uwe Schroeder
摘要
Ferroelectric hafnium and zirconium oxides have undergone rapid scientific development over the last decade, pushing them to the forefront of ultralow-power electronic systems. Maximizing the potential application in memory devices or supercapacitors of these materials requires a combined effort by the scientific community to address technical limitations, which still hinder their application. Besides their favorable intrinsic material properties, HfO2–ZrO2 materials face challenges regarding their endurance, retention, wake-up effect, and high switching voltages. In this Roadmap, we intend to combine the expertise of chemistry, physics, material, and device engineers from leading experts in the ferroelectrics research community to set the direction of travel for these binary ferroelectric oxides. Here, we present a comprehensive overview of the current state of the art and offer readers an informed perspective of where this field is heading, what challenges need to be addressed, and possible applications and prospects for further development.