微电子
无定形固体
苯
多酚
分子
抵抗
玻璃化转变
材料科学
电子束光刻
平版印刷术
纳米技术
高分子化学
光电子学
光化学
化学
有机化学
聚合物
抗氧化剂
图层(电子)
作者
Jeong-Seok Mun,Jihoon Woo,Yejin Ku,Hyun‐Taek Oh,Jin Hyun Lee,Jin‐Kyun Lee,Kanghyun Kim,Byeong‐Gyu Park,Sangsul Lee
出处
期刊:ACS materials letters
[American Chemical Society]
日期:2023-03-14
卷期号:5 (4): 1164-1169
被引量:2
标识
DOI:10.1021/acsmaterialslett.2c01150
摘要
In this study, we report the synthesis of a dendritic polyphenol characterized by a high glass transition temperature (Tg), comparable to that of poly(4-hydroxystyrene). Although the molecule (DP8) was designed to have a molecular weight as low as 1169 g/mol with eight hydroxyl groups, it exhibited a Tg of ca. 160 °C along with a stable amorphous nature when prepared from the trityl chloride structural motif. The beneficial effect of its high Tg was revealed when DP8 was converted to an acid-labile derivative, DP8-tBOC, with tert-butoxycarbonyl (tBOC) protective moieties. Compared to its smaller counterpart based on six hydroxyl units, DP8-tBOC could survive at higher temperatures, with a slower acid diffusion rate under proton injection conditions. These characteristics enabled the formation of 130 nm thick, 50 nm wide patterns in a lithographic experiment using a focused electron beam. As a versatile building block, DP8 was also derivatized into a fluoroalkylated molecule, DP8-PPVE, which produced 50 nm-sized features under electron-beam lithographic conditions. These results demonstrate the strong potential of the low-molecular-weight, high-Tg DP8 molecule as an extreme UV resist platform for high-resolution microlithography.
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