The effect of chemical polishing treatment on the microstructure, photoelectric properties of CdZnTe polycrystalline films

In this paper, CdZnTe polycrystalline film grown by the close-spaced sublimation (CSS) was chemically polished. Energy dispersive spectrum (EDS), atomic force microscope (AFM), Raman spectroscopy, current-voltage (I–V) characteristics and current-time (I-T) measurements were used to test the effect of the corrosion time of brominated methanol etching solution (with the ratio of CH3OH:Br2 = 50:1.5) on the structure, surface morphology and photoelectric properties of CdZnTe polycrystalline films. The results indicate that appropriate chemical polishing time can reduce the surface roughness, surface defects and leakage current of CdZnTe film and improve the photoelectric properties of CdZnTe film.