Determining geometric error model parameters of a terrestrial laser scanner through two-face, length-consistency, and network methods

校准 一致性(知识库) 计算机科学 面子(社会学概念) 激光跟踪器 过程(计算) 比例(比率) 扫描仪 算法 数据一致性 激光器 数学 人工智能 光学 统计 物理 社会学 操作系统 社会科学 量子力学
作者
Ling Wang,Bala Muralikrishnan,Prem Rachakonda,Daniel Sawyer
出处
期刊:Measurement Science and Technology [IOP Publishing]
卷期号:28 (6): 065016-065016 被引量:19
标识
DOI:10.1088/1361-6501/aa6929
摘要

Terrestrial laser scanners (TLS) are increasingly used in large-scale manufacturing and assembly where required measurement uncertainties are on the order of few tenths of a millimeter or smaller. In order to meet these stringent requirements, systematic errors within a TLS are compensated in-situ through self-calibration. In the Network method of self-calibration, numerous targets distributed in the work-volume are measured from multiple locations with the TLS to determine parameters of the TLS error model. In this paper, we propose two new self-calibration methods, the Two-face method and the Length-consistency method. The Length-consistency method is proposed as a more efficient way of realizing the Network method where the length between any pair of targets from multiple TLS positions are compared to determine TLS model parameters. The Two-face method is a two-step process. In the first step, many model parameters are determined directly from the difference between front-face and back-face measurements of targets distributed in the work volume. In the second step, all remaining model parameters are determined through the Length-consistency method. We compare the Two-face method, the Length-consistency method, and the Network method in terms of the uncertainties in the model parameters, and demonstrate the validity of our techniques using a calibrated scale bar and front-face back-face target measurements. The clear advantage of these self-calibration methods is that a reference instrument or calibrated artifacts are not required, thus significantly lowering the cost involved in the calibration process.

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