材料科学
薄膜
溅射沉积
基质(水族馆)
沉积(地质)
光电子学
溅射
硅
腔磁控管
纳米技术
古生物学
海洋学
沉积物
地质学
生物
作者
Jian‐Wei Hoon,Kah‐Yoong Chan,Jegenathan Krishnasamy,Teck Yong Tou
出处
期刊:Nucleation and Atmospheric Aerosols
日期:2011-01-01
被引量:2
摘要
Zinc oxide (ZnO) is a very promising material for emerging large area electronic applications including thin‐film sensors, transistors and solar cells. We fabricated ZnO thin films by employing direct current (DC) magnetron sputtering deposition technique. ZnO films with different thicknesses ranging from 100 nm to 1020 nm were deposited on silicon (Si) substrate. The deposition pressure was varied from 12 mTorr to 25 mTorr. The influences of the film thickness and the deposition pressure on structural properties of the ZnO films were investigated using Mahr surface profilometer and atomic force microscopy (AFM). The experimental results reveal that the film thickness and the deposition pressure play significant role in the structural formation of the deposited ZnO thin films. ZnO films deposited on Si substrates are promising for variety of thin‐film sensor applications.
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