口译(哲学)
硅
粘结长度
强度(物理)
Atom(片上系统)
材料科学
分布(数学)
激发
方向(向量空间)
分子物理学
氧原子
原子物理学
结晶学
化学
光学
物理
数学
分子
晶体结构
几何学
数学分析
量子力学
嵌入式系统
有机化学
冶金
计算机科学
程序设计语言
作者
R. L. Mozzi,Β. E. Warren
标识
DOI:10.1107/s0021889869006868
摘要
A new study of the structure of vitreous silica has been made under greatly improved conditions. Using Rh Kα radiation with the method of fluorescence excitation, reliable intensity values were measured to 4π sinθ/λ = 20. The interpretation was in terms of pair functions, thereby eliminating the approximations in earlier work. Each silicon is tetrahedrally surrounded by 4 oxygen atoms, with a Si–O distance which is closely 1.62 Å. Each oxygen atom is bonded to 2 silicon atoms. The Si–O–Si bond angle α shows a distribution V(α) extending all the way from 120° to 180°, with a maximum at α = 144°. This wide variation in α is an important distinction between the vitreous and the crystalline forms of silica, and it furnishes an important criterion for any proposed model of vitreous silica. Good agreement with the measured pair function distribution curve was obtained by assuming a random orientation about the Si–O bond directions. The interpretation leads to the familiar random network model, but with the new results the model is more precise.
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