电阻随机存取存储器
晶体管
电气工程
电阻器
材料科学
MOSFET
光电子学
场效应晶体管
电压
非易失性存储器
CMOS芯片
电子工程
计算机科学
工程类
作者
Ming-Chi Wu,Yi-Wei Lin,Wen-Yueh Jang,Chen-Hsi Lin,Tseung‐Yuen Tseng
出处
期刊:IEEE Electron Device Letters
[Institute of Electrical and Electronics Engineers]
日期:2011-06-28
卷期号:32 (8): 1026-1028
被引量:99
标识
DOI:10.1109/led.2011.2157454
摘要
The Ti/ZrO 2 /Pt resistive memory devices with one transistor and one resistor (1T1R) architecture are successfully fabricated in this letter. The tested devices show low operation current (20 μA), low switching voltage (set/reset, 0.8/-1 V), and reliable data retention for low-resistance state (LRS) with a 20-μA set current at 80°C (over ten years) via an excellent current limiter, namely, a metal-oxide-semiconductor field-effect transistor (MOSFET). In addition, multilevel storage characteristics are also demonstrated by modulating the amplitude of the MOSFET gate voltage. The various LRS levels obtained are possibly attributed to the formation of different numbers and sizes of conducting filaments consisting of oxygen vacancies caused by an external electric field. Moreover, reproducible resistive switching characteristics up to 2000 switching cycles are achieved in the same device. Our 1T1R ZrO 2 -based resistive switching access memory with low-power and highly reliable multilevel operation has high potential for practical applications.
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