超晶格
材料科学
光电子学
降级(电信)
泄漏(经济)
基质(水族馆)
拉伤
图层(电子)
纳米技术
电子工程
海洋学
内科学
地质学
工程类
宏观经济学
经济
医学
作者
Xiaoguang He,Yuxia Feng,Xuelin Yang,Shan Wu,Zidong Cai,Jia Wei,Jianfei Shen,Huayang Huang,Danshuo Liu,Zhenghao Chen,Cheng Ma,Weikun Ge,Bo Shen
标识
DOI:10.35848/1882-0786/ac3dc0
摘要
Abstract In this work, we study the impacts of different types of strain relief layer (SRL) on dynamic on-resistance ( R on ) degradation of GaN power devices on Si by back-gate ramping and vertical leakage measurement. Our study reveals that the SRL has important effects on the dynamic R on . Compared with step-graded AlGaN SRL, the superlattice SRL possesses much more energy barriers, which can more effectively block the leakage of holes from GaN buffer and the injection of electrons from Si substrate. Enhancing the carrier blocking ability of SRL could contribute to the suppression of dynamic R on degradation.
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