研磨
抛光
固定装置
模具(集成电路)
舍入
化学机械平面化
材料科学
计算机科学
GSM演进的增强数据速率
断层(地质)
扫描电子显微镜
样品(材料)
机械工程
工程制图
复合材料
工程类
人工智能
纳米技术
物理
地震学
地质学
操作系统
热力学
作者
Hoon Ye Gwee,Kiong Kay Ng
出处
期刊:Proceedings
日期:2013-11-01
卷期号:80224: 576-581
标识
DOI:10.31399/asm.cp.istfa2013p0576
摘要
Abstract Parallel lapping (often called delayering) is a commonly used process in failure analysis of integrated circuits. However, parallel lapping commonly gives rise to the issue of weak sample preparation method especially on specimen mounting. The traditional specimen mounting technique was done by mounted a single die to polishing fixture using drop of super glue. Using conventional methods, problems such as losing the die during polishing, serious edge rounding are often encountered. Further, loading the whole polishing fixture into Scanning Electron Microscopy machine for SEM imaging or Passive Voltage Contrast (PVC) fault localization can be complicated due to the size of polishing fixture. Therefore, an alternative, relatively fast and simple method to overcome the above mentioned obstacles is proposed.
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