深能级瞬态光谱
异质结
材料科学
二极管
光电子学
外延
氧化物
微晶
纳米技术
图层(电子)
硅
冶金
作者
Yun Jia,Aboulaye Traoré,Ryo MORITA,Fenfen Fenda Florena,Muhammad Monirul Islam,T. Sakurai
摘要
Defects in p-type oxide/β-Ga2O3 heterojunction diodes were investigated using p-type Cu2O as a case study. Diodes with polycrystalline and epitaxial Cu2O films were analyzed using deep-level transient spectroscopy. For both diodes, two electron bulk defects were detected, including a minority defect at 0.23 eV below EC within Cu2O and a majority defect at 0.53 eV below EC within β-Ga2O3. Furthermore, a high-density interface state of 4.5 × 1012 cm−2/eV was observed in the polycrystalline Cu2O/β-Ga2O3 diode. The presence of a high density of interface states helped reduce the turn-on voltage owing to the interface recombination current. However, it also enabled electron carriers to tunnel through the interface to β-Ga2O3, followed by variable range hopping through the bulk defect in the β-Ga2O3 layer, ultimately causing undesirable premature breakdown. The results of this study underscore the critical role of optimizing the crystal structure during p-type oxide growth for desired defect characteristics, particularly concerning interface states, in β-Ga2O3 bipolar devices for different applications, offering insights for high-performance power rectifier development.
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