聚合物
介观物理学
影象
材料科学
蒸发
化学物理
硅
纳米技术
不稳定性
扫描电子显微镜
化学工程
化学
复合材料
光学
热力学
机械
物理
量子力学
冶金
工程类
作者
Edward Bormashenko,Roman Pogreb,Oleg Stanevsky,Yelena Bormashenko,Tamir Stein,Oleg Gengelman
出处
期刊:Langmuir
[American Chemical Society]
日期:2005-09-16
卷期号:21 (21): 9604-9609
被引量:50
摘要
Mesoscopically ordered patterns were obtained when polymer solutions were applied to tilted substrates and evaporated immediately under ambient conditions in a slow air current. The patterns were studied with optical, scanning electron, and atomic force microscopy. Shadowgraph visualization of the patterning was carried out, and visualization of the flow with an ink tracer was performed. Restrained and nonrestrained flows of the polymer solution gave rise to very similar patterning. The formation of the patterns on different solid substrates, including substrates wetted with silicon oil, was investigated. The concentration of the polymer solutions exerted an influence on the characteristic dimension of mesoscaled cells. A physical mechanism of the patterning is proposed. The mechanism is based on the mass transport instability occurring under the intensive evaporation of the solvent. The model satisfactorily explains the experimental findings.
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