电迁移
可靠性(半导体)
材料科学
反向偏压
晶体管
光电子学
功率(物理)
焊接
功率半导体器件
电气工程
功率MOSFET
栅氧化层
可靠性工程
电子工程
MOSFET
工程类
复合材料
物理
电压
量子力学
二极管
作者
N. Tošić,B. Peśić,N. Stojadinović
标识
DOI:10.1016/s0026-2714(97)00155-8
摘要
In this paper we have investigated reliability and failure mechanisms in power VDMOSFETs subjected to HTRB (High-Temperature-Reverse-Bias) test. It has been found that electromigration at contacts, intemetalic processes at the solder joint and gate oxide breakdown are the main failure mechanisms.
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