Optical element sub-surface defect detection combining fluorescence and scattering imaging

Fused silica optical elements are widely used in large high-power laser devices, and the subsurface defects of optical elements directly affect the laser damage threshold and imaging quality. These defects are distributed within a few to tens of microns from the surface and cannot be detected by conventional imaging methods. The characteristics of small size, low density and wide distribution range make it difficult to detect nondestructively, effectively and quickly with conventional methods. In order to solve the above problems, an experimental system was built based on the principles of photoluminescence and dark field scattering. Use the different characteristics of fluorescence image and scattering image to carry out the research of subsurface defect detection. First, preprocess the original image. Second, calculate the offset of adjacent images, perform background homogenization processing on the image, and stitch the sub-aperture images, and then segment the full-aperture image. Then, a more effective subsurface defect extraction algorithm is proposed. Finally, etch the sample with HF and observe it under a microscope. Experimental results show that this method can detect weak defects on the surface and sub-surface at the same time, and can effectively separate individual sub-surface defects. This method has the advantages of lossless, fast and high precision. Moreover, based on a large amount of data, analysis and summary of the causes of defects, distribution characteristics, etc.. This method can provide certain guidance for the evaluation of laser damage threshold and processing technology of optical components in high-power laser devices.