Nanoscale friction of CVD single-layer MoS2 with controlled defect formation

二硫化钨 二硫化钼 材料科学 摩擦学 纳米材料 润滑 干润滑剂 化学气相沉积 纳米尺度 纳米技术 图层(电子) 晶界 复合材料 石墨烯 冶金 微观结构
作者
Min Gi Choi,Alex Belianinov,Alison A. Pawlicki,Seonha Park,Habeom Lee,Olga S. Ovchinnikova,Songkil Kim
出处
期刊:Surfaces and Interfaces [Elsevier]
卷期号:26: 101437-101437 被引量:13
标识
DOI:10.1016/j.surfin.2021.101437
摘要

Two-dimensional (2D) layered nanomaterials such as graphene, molybdenum disulfide (MoS2), or tungsten disulfide offer a promising solution in areas of solid-state lubrication, due to their excellent mechanical properties as well as low friction. However, defects can influence their friction and reduce their superior tribological properties. Thus, it is crucial to understand the effects of defects on sliding behavior in 2D nanomaterials, to foster a functional strategy for utilizing 2D nanomaterials as solid-state tribological films. In this study, frictional effects of defects, grain boundaries, and atomic-scale structural defects were explored on chemical vapor deposition (CVD) grown single layer MoS2. Selective patterning of defects into MoS2 was accomplished via controlled irradiation of helium ions with varying ion doses. The friction of MoS2 was characterized by friction force microscopy (FFM) and was found that friction depends on the defect formation controlled by helium ion irradiation. This approach offers a correlation between surface topography, defects and friction. Understanding the relative friction of MoS2 in the presence of different levels of defects is foundational to studying tribological properties of a single layer MoS2 at both nanoscales and macroscales.

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