化学气相沉积
薄膜
蚀刻(微加工)
分析化学(期刊)
沉积(地质)
蒸发
燃烧化学气相沉积
物理气相沉积
等离子体
材料科学
溅射
离子镀
等离子体增强化学气相沉积
等离子体处理
碳膜
化学
纳米技术
图层(电子)
环境化学
物理
古生物学
量子力学
沉积物
生物
热力学
作者
John L. Vossen,W. Kern,Julius Klerer
摘要
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Key Features * Provides an all-new sequel to the 1978 classic, Thin Film Processes * Introduces new topics, and several key topics presented in the original volume are updated * Emphasizes practical applications of major thin film deposition and etching processes * Helps readers find the appropriate technology for a particular application
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