化学气相沉积
薄膜
蚀刻(微加工)
分析化学(期刊)
沉积(地质)
蒸发
燃烧化学气相沉积
物理气相沉积
等离子体
材料科学
溅射
离子镀
等离子体增强化学气相沉积
等离子体处理
碳膜
化学
纳米技术
图层(电子)
环境化学
物理
古生物学
量子力学
沉积物
生物
热力学
摘要
J.L. Vossen and W. Kern, Introduction. S.M. Rossnagel, Glow Discharge Plasma and Sources for Etching and Deposition. C.V. Deshpandey and R.F. Bunshah, Evaporation Processes. P.P. Chow, Molecular Beam Epitaxy. R. Parsons, Sputter Deposition Processes. P.C. Johnson, The Cathodic Arc Plasma Deposition of Thin Films. K.F. Jensen and W. Kern, Thermal Chemical Vapor Deposition. K.F. Jensen and T. Kuech, Metal-Organic Chemical Vapor Deposition. J.G. Eden, Photochemical Vapor Deposition. L.C. Klein, Sol-Gel Coatings. R. Reif and W. Kern, Plasma-Enhanced Chemical Vapor Deposition. G. Lucovsky, D.V. Tsu, R.A. Rudder, and R.J. Markunas, Formation of Inorganic Films by Remote Plasma-Enhanced Chemical-Vapor Deposition. T.M. Mayer and S.D. Allen, Selected Area Processing. H.W. Lehman, Plasma-Assisted Etching. P.R. Puckett, S.L. Michel, and W.E. Hughes, Ion Beam Etching. C.I.H. Ashby, Laser-Driven Etching.
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