制作
纳米光刻
材料科学
抵抗
聚焦离子束
离子束
电子束诱导沉积
纳米技术
离子
离子束光刻
溅射
阴极射线
平版印刷术
梁(结构)
电子
纳米
电子束光刻
离子铣床
工程物理
光电子学
薄膜
化学
光学
物理
透射电子显微镜
复合材料
扫描透射电子显微镜
图层(电子)
有机化学
替代医学
病理
量子力学
医学
作者
Ivo Utke,P. Hoffmann,J. Melngailis
出处
期刊:Journal of vacuum science & technology
[American Vacuum Society]
日期:2008-07-01
卷期号:26 (4): 1197-1276
被引量:944
摘要
Beams of electrons and ions are now fairly routinely focused to dimensions in the nanometer range. Since the beams can be used to locally alter material at the point where they are incident on a surface, they represent direct nanofabrication tools. The authors will focus here on direct fabrication rather than lithography, which is indirect in that it uses the intermediary of resist. In the case of both ions and electrons, material addition or removal can be achieved using precursor gases. In addition ions can also alter material by sputtering (milling), by damage, or by implantation. Many material removal and deposition processes employing precursor gases have been developed for numerous practical applications, such as mask repair, circuit restructuring and repair, and sample sectioning. The authors will also discuss structures that are made for research purposes or for demonstration of the processing capabilities. In many cases the minimum dimensions at which these processes can be realized are considerably larger than the beam diameters. The atomic level mechanisms responsible for the precursor gas activation have not been studied in detail in many cases. The authors will review the state of the art and level of understanding of direct ion and electron beam fabrication and point out some of the unsolved problems.
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