异质结
石墨烯
材料科学
纳米技术
成核
化学气相沉积
薄脆饼
氮化硼
蓝宝石
外延
光电子学
化学
图层(电子)
物理
光学
有机化学
激光器
作者
Isaac G. Juma,Gwangwoo Kim,Deep Jariwala,Sanjay K. Behura
出处
期刊:iScience
[Elsevier]
日期:2021-11-01
卷期号:24 (11): 103374-103374
被引量:17
标识
DOI:10.1016/j.isci.2021.103374
摘要
Hexagonal boron nitride (h-BN) and its heterostructures with graphene are widely investigated van der Waals (vdW) quantum materials for electronics, photonics, sensing, and energy storage/transduction. However, their metal catalyst-based growth and transfer-based heterostructure assembly approaches present impediments to obtaining high-quality and wafer-scale quantum material. Here, we have presented our perspective on the synthetic strategies that involve direct nucleation of h-BN on various dielectric substrates and its heterostructures with graphene. Mechanistic understanding of direct growth of h-BN via bottom-up approaches such as (a) the chemical-interaction guided nucleation on silicon-based dielectrics, (b) surface nitridation and N+ sputtering of h-BN target on sapphire, and (c) epitaxial growth of h-BN on sapphire, among others, are reviewed. Several design methodologies are presented for the direct growth of vertical and lateral vdW heterostructures of h-BN and graphene. These complex 2D heterostructures exhibit various physical phenomena and could potentially have a range of practical applications.
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