光催化
盐酸
剥脱关节
罗丹明B
纳米片
材料科学
石墨氮化碳
氮化碳
可见光谱
光化学
吸收(声学)
化学工程
无机化学
纳米技术
化学
光电子学
复合材料
冶金
有机化学
石墨烯
催化作用
工程类
作者
Changchang Dong,Zhiyuan Ma,Runtian Qie,Xuhong Guo,Cuihua Li,Rongjie Wang,Yulin Shi,Bin Dai,Xin Jia
标识
DOI:10.1016/j.apcatb.2017.06.028
摘要
In this work, a hydrochloric acid assisted exfoliation approach to prepare the ultrathin carbon nitride (U-CN) nanosheet and to regulate its morphology and defects was reported. Based on moderate oxidation of hydrochloric acid, bulk carbon nitride (BCN) was just right broken into small pieces with protonation, which is beneficial to the exfoliation of BCN to U-CN nanosheets. Meanwhile, the main structure of CN do not be destroyed. Moreover, hydrochloric acid gives priority to cleave the bridging N atoms with rich elections, leading to the formation of the favorable defects and improving its photocatalytic performance. The obtained U-CN nanosheets prepared in a suitable HCl concentration exhibits enhanced photocatalytic efficiency for hydrogen evolution and Rhodamine B degradation under visible light. Such U-CN nanosheets with simple preparation, low cost, good yield and good photocatalytic activity might shed light on an acid-assisted method for developing high-performance CN photocatalysts.
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