非阻塞I/O
X射线光电子能谱
电化学
镍
化学气相沉积
分析化学(期刊)
材料科学
氢氧化物
氧化镍
氧气
沉积(地质)
无机化学
催化作用
化学
电极
化学工程
物理化学
纳米技术
冶金
环境化学
古生物学
有机化学
工程类
生物
生物化学
沉积物
作者
Natascha Weidler,Jona Schuch,Florian Knaus,Patrick Stenner,Sascha Hoch,Artjom Maljusch,Rolf Schäfer,Bernhard Kaiser,Wolfram Jaegermann
标识
DOI:10.1021/acs.jpcc.6b12652
摘要
We report here the plasma-enhanced chemical vapor deposition and electrocatalytic characterization of pure NiOx and NiOx(OH)y. Whereas NiOx is deposited if oxygen is used as a reactive gas, the use of air as a reactive gas leads to the deposition of the NiOx(OH)y, which is electrochemically more active than the NiOx. By recording X-ray photoelectron spectra from the as-deposited catalysts and after their electrochemical investigations, we determined that the electrochemical activity correlates with the amount of hydroxide sites on the surface. Such a behavior was already observed for CoOx and CoOx(OH)y. As a consequence, CoNiOx(OH)y was deposited using air as a reactive gas to study the influence of nickel on the electronic structure of CoOx(OH)y and its effect on the electrochemical activity.
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