碲
记忆电阻器
水平和垂直
光电子学
蚀刻(微加工)
材料科学
地质学
纳米技术
电气工程
工程类
大地测量学
冶金
图层(电子)
作者
Luji Li,Gaojie Zhang,Muhammad Younis,Tianyuan Luo,Yang Li,Jin Wen,Hao Wu,Bichen Xiao,Wenfeng Zhang,Haixin Chang
出处
期刊:ACS applied electronic materials
[American Chemical Society]
日期:2024-04-01
卷期号:6 (4): 2161-2167
被引量:1
标识
DOI:10.1021/acsaelm.3c01434
摘要
2D tellurium (Te) films are appealing materials in electronic devices like transistors and detectors. However, applications in the field of memristors of the 2D Te film are still rare. Here, we report large-area 2D Te films prepared by two-step thermal evaporation, which achieves memristor functions in vertical and horizontal devices after O2 ion etching. The vertical memristor has a long retention time of more than 10000 s and multilevel storage capabilities, and the response speeds of high- and low-resistance states are on the order of nanoseconds. The horizontal devices can simulate synaptic functions such as short- or long-term memory transformation and paired-pulse depression. Our work demonstrates that 2D thin Te films are a promising material in the field of memristors.
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