Microscopic studies on transparent AlSiN ternary hard coating

In this work AlSi nanocomposite coating were deposited by RF magnetron sputtering in Ar/N2 reactive atmosphere. AlSi alloy target of composition 86:14 wt % have been used to deposit the coating on float glass substrate by varying the deposition time: starting from 0.5 h to 2 h. The substrate temperature and target power were fixed at 250 °C and 100 W respectively. The effect of deposition time on microstructure, mechanical and optical property were studied by usingX-ray Diffraction (XRD), Stylus profiler, Field Emission Scanning Electron Microscope (FESEM), Energy Dispersive X-ray Spectroscopy (EDS), Transmission Electron Microscopy (TEM), UV–Visible Spectrometer and Nanoindentation techniques. The XRD shows the formation h-AlN phase for film deposited for 2 h which shows that with increase in deposition time, the film structure changes from amorphous to polycrystalline, the coating deposited for 2 h develops wurtzite-AlN nanocrystalline structure. The thickness of the coating increases with respect to the increasing deposition time which was confirmed from stylus profiler. The FESEM study shows the uneven and randomly oriented grains present in the coating. TEM study confirms the amorphous and polycrystalline nature of the films with low and high thickness respectively. The elemental composition was confirmed by EDS. UV–Visible Spectrometer delivers the optical transparency of the film which is >90% for all the coatings in the visible range spectra. The roughness of the samples was also measured from scanning probe microscope image, which showed average roughness (Rã) value below 2 nm. The maximum hardness obtained is 31 GPa for the coating deposited 2 h with 490 nm thickness, it has an elastic recovery of 92% which suggest its resistance to elasticity as well as plastic deformation.