极紫外光刻
材料科学
平版印刷术
抵抗
纳米技术
下一代光刻
多重图案
工程物理
光电子学
电子束光刻
工程类
图层(电子)
作者
Yeo Kyung Kang,Sun Jin Lee,Sunghun Eom,Byeong Geun Kim,Chan-Cuk Hwang,Myung‐Gil Kim
摘要
The continuous scaling down of semiconductor devices has significantly benefited consumers by enhancing the device performance, portability, power efficiency, and affordability. Recently, chip makers have embraced extreme ultraviolet (EUV) lithography...
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