范德瓦尔斯力
压电响应力显微镜
材料科学
压电
铁电性
压电系数
化学物理
凝聚态物理
分子动力学
纳米技术
物理
光电子学
计算化学
化学
电介质
分子
复合材料
量子力学
作者
John A. Brehm,Sabine M. Neumayer,Tao Lei,Andrew O’Hara,Marius Chyasnavichus,Michael A. Susner,Michael A. McGuire,Sergei V. Kalinin,Stephen Jesse,Panchapakesan Ganesh,Sokrates T. Pantelides,Petro Maksymovych,Nina Balke
出处
期刊:Nature Materials
[Springer Nature]
日期:2019-11-18
卷期号:19 (1): 43-48
被引量:173
标识
DOI:10.1038/s41563-019-0532-z
摘要
The family of layered thio- and seleno-phosphates has gained attention as potential control dielectrics for the rapidly growing family of two-dimensional and quasi-two-dimensional electronic materials. Here we report a combination of density functional theory calculations, quantum molecular dynamics simulations and variable-temperature, -pressure and -bias piezoresponse force microscopy data to predict and verify the existence of an unusual ferroelectric property—a uniaxial quadruple potential well for Cu displacements—enabled by the van der Waals gap in copper indium thiophosphate (CuInP2S6). The calculated potential energy landscape for Cu displacements is strongly influenced by strain, accounting for the origin of the negative piezoelectric coefficient and rendering CuInP2S6 a rare example of a uniaxial multi-well ferroelectric. Experimental data verify the coexistence of four polarization states and explore the temperature-, pressure- and bias-dependent piezoelectric and ferroelectric properties, which are supported by bias-dependent molecular dynamics simulations. These phenomena offer new opportunities for both fundamental studies and applications in data storage and electronics. The atomic displacements that generate ferroelectricity in materials commonly fit a double-well potential energy surface. Here, ferroelectricity in two-dimensional CuInP2S6 is shown to fit a quadruple well due to the van der Waals gap between layers of this material.
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