极紫外光刻
计算
衍射
光学
计算机科学
散射
严格耦合波分析
极端紫外线
物理
算法
衍射光栅
激光器
作者
Taian Fan,Yayi Wei,Lisong Dong
摘要
The oblique illumination in EUVL system combined with relative thick absorber layer of EUV mask introduces many new challenges for mask simulation, like asymmetric phase deformation, shadowing effects , secondary scattering. Besides, these effects result in the ineffectiveness of the Hopkins approach and require new method for mask diffraction computation. A 3D RCWA algorithm is implemented to perform rigorous computation of lights diffracted by the EUV masks. Several examples are designed, analyzed and presented in this paper. Furthermore, a fast version of the rigorous 3D algorithm is implemented by properly decomposing the 3D model into multiple simpler ones, thus the computational time is reduced.
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