Highly sensitive positive-working molecular resist based on new molecule

A highly sensitive positive-working molecular resist based on a new molecule, 1,3,5-tris[p-(p-hydroxyphenyl)-phenyl]benzene (THTPPB), was designed and synthesized. THTPPB showed a high glass transition temperature (Tg) of 145°C. Some acid-leaving groups were attached to THTPPB to realize positive-working performance developed by an alkaline aqueous developer. 70nm line-and-space (1:1) positive tone pattern was fabricated with high sensitivity (<1μC∕cm2) by the exposure to a low-energy electron beam (5keV).