Estimation of the Life of Synthetic Silica Glass under Long Time Irradiation by ArF Excimer Laser

The life of synthetic silica glass under ArF excimer laser irradiation was estimated in relation to the laser energy density by in-situ photoabsorption measurements under exposure to more than 10 7 shots. Dissolved hydrogen increases the life whereas OH in the glass scarcely influences it. Usual photomask glass is found to be tolerable to more than 10 11 shots at 0.1 mJ/cm 2 of laser irradiation intensity.