泄漏(经济)
CMOS芯片
材料科学
像素
电容器
节点(物理)
图像传感器
光电子学
电压
宽动态范围
电子工程
动态范围
电气工程
物理
工程类
声学
光学
经济
宏观经济学
作者
Dong-Soo Kim,Youngcheol Chae,Jihyun Cho,Gunhee Han
标识
DOI:10.1109/ted.2008.2003023
摘要
A dual-capture wide dynamic range CMOS image sensor using an in-pixel floating-diffusion (FD) storage capacitor is proposed. The proposed structure uses the FD as a storage capacitor. The potential of the FD node is read out using a floating-gate capacitor without a contact metallization of the FD node to reduce the leakage. The proposed sensor was fabricated using a 0.35-mum CMOS process. The chip includes 320 times 240 pixels whose pitch is 5.6 mum and whose fill factor is 36%. The measurement results show 100-dB dynamic range, and the leakage at the non-metalized FD is reduced to about one-third of that of the conventional FD with the contact metallization.
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